Lithographic apparatus and device manufacturing method

摘要

A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

主权项

1. An exposure apparatus, comprising:
a liquid supply system configured to at least partly fill a space, adjacent a substrate table to hold a substrate, with a liquid; and a projection system to project a patterned radiation beam onto the substrate, the projection system having an optical element, the optical element having a bottom surface through which the pattern is projected and a side surface extending away from the bottom surface, wherein the bottom surface and the side surface are in contact with the liquid at least during exposure and wherein at least a part of the side surface has a protective layer, wherein the liquid supply system comprises a liquid confinement member having a surface extending above the bottom surface of the optical element and between which surface extending above the bottom surface of the optical element and the side surface of the optical element liquid enters at least during exposure and the liquid confinement member having a bottom surface above the substrate table, at least part of the liquid confinement member extending below the bottom surface of the optical element and above the substrate table to define an aperture through which the patterned beam and liquid passes at least during exposure and the liquid confinement member comprising an outlet, in the bottom surface of the liquid confinement member, to remove liquid.