Salt, photoresist composition and method for producing photoresist pattern

摘要

A salt represented by formula (I):;
wherein Q1, Q2, L1, W, and Z+are defined in the specification.

主权项

1. A salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, the moiety L1-OH of formula (I) is represented by formula (L1-1): wherein X0 represents a single bond, a C1-C14 divalent aliphatic hydrocarbon group which can have a fluorine atom or a hydroxyl group, or a group represented by formula (a-1):
-A10X10-A11s X11-A12-*  (a-1) where s represents an integer of 0 or 1, X10 and X11 each independently respect an oxygen atom, a carbonyl group, a carbonyloxy group, or an oxycarbonyl group, A10,A11 and A12 each independently represent a C1-C12 divalent aliphatic hydrocarbon group which can have a fluorine atom or a hydroxyl group, * represents a binding position to a corbon atom, X1 represents —O-*1, —NR2-*1, —O—CO-*1, —O—CH2—CO—O-*1 or —NR2—CH2-*1 where *1 represents a binding position to W, *0 represents a binding position to a carbon atom binding to Q1 and Q2, and m1 represents an integer of 0 to 6, W represents a C3-C36 alicyclic hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group, and in which a hydrogen atom can be replaced by a hydroxy group, a C1-C12 alkyl group, a C1-C12 alkoxy group, C3-C18 alicyclic hydrocarbon group or C6-C14 aromatic hydrocarbon group, and Z+ represents an organic cation.