| 发明名称 | Lithographic apparatus and a device manufacturing method | ||
| 摘要 | A meniscus pinning device has a plurality of openings through which liquid and gas from the environment are extracted. The openings are of an intermediate size, having a maximum cross-sectional dimension (e.g., diameter) in the range of from about 75 μm to about 150 μm. | ||
| 申请公布号 | US8804094(B2) | 申请公布日期 | 2014.08.12 |
| 申请号 | US201113024364 | 申请日期 | 2011.02.10 |
| 申请人 | ASML Netherlands B.V. | 发明人 | Riepen Michel;Kemper Nicolaas Rudolf |
| 分类号 | G03B27/52 | 主分类号 | G03B27/52 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. A lithographic apparatus comprising: a table configured to hold a substrate; a projection system configured to project an image onto the substrate while the table and the projection system are moved relative to each other; and a liquid confinement structure arranged to confine a liquid to a space between the projection system and the substrate and/or table, the liquid confinement structure having a meniscus pinning device arranged to pin a meniscus of the liquid, the meniscus pinning device comprising a plurality of openings arranged in use to be connected to an under-pressure, the openings having a maximum cross-sectional dimension in the range of from 75 μm to 150 μm. | ||
| 地址 | Veldhoven NL | ||