发明名称 |
Method for forming a PCRAM with low reset current |
摘要 |
Phase-change memory structures are formed with ultra-thin heater liners and ultra-thin phase-change layers, thereby increasing heating capacities and lowering reset currents. Embodiments include forming a first interlayer dielectric (ILD) over a bottom electrode, removing a portion of the first ILD, forming a cell area, forming a u-shaped heater liner within the cell area, forming an interlayer dielectric structure within the u-shaped heater liner, the interlayer dielectric structure including a protruding portion extending above a top surface of the first ILD, forming a phase-change layer on side surfaces of the protruding portion and/or on the first ILD surrounding the protruding portion, and forming a dielectric spacer surrounding the protruding portion. |
申请公布号 |
US8803122(B2) |
申请公布日期 |
2014.08.12 |
申请号 |
US201213562641 |
申请日期 |
2012.07.31 |
申请人 |
GlobalFoundries Singapore Pte. Ltd. |
发明人 |
Tan Shyue Seng (Jason);Toh Eng Huat |
分类号 |
H01L47/00 |
主分类号 |
H01L47/00 |
代理机构 |
Ditthavong & Steiner, P.C. |
代理人 |
Ditthavong & Steiner, P.C. |
主权项 |
1. A method comprising:
forming a first interlayer dielectric (ILD) over a bottom electrode; removing a portion of the first ILD, forming a cell area; forming a u-shaped heater liner within the cell area; forming an interlayer dielectric structure within the u-shaped heater liner, the interlayer dielectric structure including a protruding portion extending above a top surface of the first ILD; forming a phase-change layer on side surfaces of the protruding portion and/or on the first ILD surrounding the protruding portion; and forming a dielectric spacer surrounding the protruding portion. |
地址 |
Singapore SG |