发明名称 Method for forming a PCRAM with low reset current
摘要 Phase-change memory structures are formed with ultra-thin heater liners and ultra-thin phase-change layers, thereby increasing heating capacities and lowering reset currents. Embodiments include forming a first interlayer dielectric (ILD) over a bottom electrode, removing a portion of the first ILD, forming a cell area, forming a u-shaped heater liner within the cell area, forming an interlayer dielectric structure within the u-shaped heater liner, the interlayer dielectric structure including a protruding portion extending above a top surface of the first ILD, forming a phase-change layer on side surfaces of the protruding portion and/or on the first ILD surrounding the protruding portion, and forming a dielectric spacer surrounding the protruding portion.
申请公布号 US8803122(B2) 申请公布日期 2014.08.12
申请号 US201213562641 申请日期 2012.07.31
申请人 GlobalFoundries Singapore Pte. Ltd. 发明人 Tan Shyue Seng (Jason);Toh Eng Huat
分类号 H01L47/00 主分类号 H01L47/00
代理机构 Ditthavong & Steiner, P.C. 代理人 Ditthavong & Steiner, P.C.
主权项 1. A method comprising: forming a first interlayer dielectric (ILD) over a bottom electrode; removing a portion of the first ILD, forming a cell area; forming a u-shaped heater liner within the cell area; forming an interlayer dielectric structure within the u-shaped heater liner, the interlayer dielectric structure including a protruding portion extending above a top surface of the first ILD; forming a phase-change layer on side surfaces of the protruding portion and/or on the first ILD surrounding the protruding portion; and forming a dielectric spacer surrounding the protruding portion.
地址 Singapore SG