Solar cell and process for producing the same

摘要

The present invention provides a method of manufacturing a solar cell, comprising forming a buffer layer comprising a group-III nitride semiconductor on a substrate using a sputtering method, and forming a group-III nitride semiconductor layer and electrodes on the buffer layer. The group-III nitride semiconductor layer is formed on the buffer layer by at least one selected from the group consisting of the sputtering method, a MOCVD method, an MBE method, a CBE method, and an MLE method, and the electrodes are formed on the group-III nitride semiconductor layer.

主权项

1. A method of manufacturing a solar cell, comprising:
forming a buffer layer comprising a group-III nitride semiconductor on a substrate using a sputtering method; forming first and second group-III nitride semiconductor layers including a p-type layer and an n-type layer having a p-n junction therein and an electrode on the buffer layer, the forming of at least one of the first and second group-III nitride semiconductor layers is performed by a sputtering method comprising:
a first step of alternately repeating a process of supplying only a dopant element and a process of simultaneously supplying a compound comprising a group-III element and a nitrogen raw material, anda second step of performing a heat treatment in a range of about 300° C. to about 1200° C. on at least one of the first and second group-III nitride semiconductor layers formed by the first step; and forming another electrode on the group-III nitride semiconductor layer including a p-type layer and an n-type layer having a p-n junction therein; wherein the sputtering method comprises reacting nitrogen in a plasma, radical, or atomic state with a group-III element, thereby forming the layer.