发明名称 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION
摘要 A chemical amplification resist composition contains: (A) a polymer compound having a phenolic hydroxyl group and a group formed by substituting a substituent for a hydrogen atom of a hydroxyl group in a phenolic hydroxyl group and satisfying the following (a) to (c) at the same time: (a) the polydispersity is 1.2 or less, (b) the weight average molecular weight is from 2,000 to 6,500, and (c) the glass transition temperature (Tg) is 140° C. or more.
申请公布号 KR101429596(B1) 申请公布日期 2014.08.12
申请号 KR20120070571 申请日期 2012.06.29
申请人 发明人
分类号 G03F1/00;G03F7/004;G03F7/11;G03F7/26 主分类号 G03F1/00
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