发明名称 Method for making grating
摘要 A method for making grating is provided. The method includes following steps. A substrate is provided. A mask layer is located on the substrate. The mask layer is patterned, and a number of bar-shaped protruding structures are formed on a surface of the mask layer, a slot is defined between each of two adjacent protruding structures of the number of protruding structures to expose a portion of the substrate. The protruding structures are etched so that each of two adjacent protruding structures begin to slant face to face until they are contacting each other. The exposed portion of the substrate is etched through the slot. The mask layer is removed.
申请公布号 US8801946(B2) 申请公布日期 2014.08.12
申请号 US201313858191 申请日期 2013.04.08
申请人 Tsinghua University;Hon Hai Precision Industry Co., Ltd. 发明人 Zhu Zhen-Dong;Li Qun-Qing;Zhang Li-Hui;Chen Mo;Fan Shou-Shan
分类号 B29D11/00 主分类号 B29D11/00
代理机构 Novak Druce Connolly Bove + Quigg LLP 代理人 Novak Druce Connolly Bove + Quigg LLP
主权项 1. A method for making a grating, comprising: applying a mask layer on a surface of a substrate; forming a plurality of bar-shaped protruding structures to expose a portion of the substrate by patterning the mask layer, wherein the plurality of bar-shaped protruding structures extend along a direction substantially parallel with the surface of the substrate; etching the plurality of protruding structures so that each of two adjacent protruding structures begin to slant face to face until they contact each other; patterning exposed portion of the substrate to form a plurality of three-dimensional nano-structure preforms, wherein a cross section of each of the plurality of three-dimensional nano-structure preforms is triangular; and removing the mask layer.
地址 Beijing CN