发明名称 Tilt structure
摘要 A tilt structure includes a shaft section formed on a substrate section, a tilt structure film having one end formed on an upper surface of the shaft section, and the other end bonded to the substrate section, and a thin film section provided to the tilt structure film, located on a corner section composed of the upper surface of the shaft section and a side surface of the shaft section, and having a film thickness thinner than the tilt structure film, the tilt structure film is bent in the thin film section, and an acute angle is formed by the substrate section and the tilt structure film.
申请公布号 US8802217(B2) 申请公布日期 2014.08.12
申请号 US201113072127 申请日期 2011.03.25
申请人 Seiko Epson Corporation 发明人 Yoshizawa Takahiko
分类号 B32B3/00 主分类号 B32B3/00
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. A tilt structure comprising: a shaft section formed on a substrate section; a thin film having one end formed on an upper surface of the shaft section, and the other end bonded to the substrate section; and a tilt structure film formed on the thin film, and having a film thickness thicker than the thin film, wherein the tilt structure film is formed on the other end of the thin film instead of a corner section composed of the upper surface of the shaft section and a side surface of the shaft section, the thin film is bent on the corner section, and an acute angle is formed by the substrate section and both of the thin film and the tilt structure film.
地址 Tokyo JP