BATCH TYPE DEPOSITION FILM FORMING APPARATUS

摘要

The present invention relates to an apparatus for forming a batch type deposition layer. The apparatus for forming a batch type layer according to an embodiment of the present invention is an apparatus for forming a batch type deposition layer on a plurality of substrates. The apparatus for forming a batch type layer includes a chamber for providing a space where the deposition layer is formed; a heater which is disposed outside the chamber and applies heat to a plurality of substrates; a substrate support disposed inside the chamber and on which substrates are mounted; a processing gas supply unit disposed to pass through the center of the substrate support inside the chamber in order to supply a processing gas to the substrates; a processing gas exhaust unit for discharging the processing gas; and a processing gas generation unit which is disposed in the chamber, generates a first processing gas by bringing a metal in a metal source to react with a gas containing halogen, and supplies the first processing gas to the processing gas supply unit.