发明名称 TEMPERATURE CONTROLLED WINDOW OF A PLASMA PROCESSING CHAMBER COMPONENT
摘要 A temperature controlled dielectric window of an induction-coupled plasma processing chamber includes a dielectric window forming an upper wall of the plasma processing chamber having at least a first channel and a second channel in the plasma processing chamber. A liquid circulation system includes a cold liquid source circulating in a first closed loop which is not fluid-communicated with the channels, a hot liquid source circulating in a second closed loop fluid-communicated with the channels, and at least a first heat exchanger and a second heat exchanger. Cold liquid passes through the first heat exchanger at a controllable flow rate, hot liquid passes through the first heat exchanger, and the temperature of the hot liquid is controlled through heat exchange with the cold liquid while the hot liquid passes through an inlet of the first channel. Liquid passes through the second heat exchanger at a controllable flow rate, the hot liquid passes through the second heat exchanger, and the temperature of the hot liquid is controlled through heat exchange with the cold liquid while the hot liquid passes through an inlet of the second channel.
申请公布号 KR20140099219(A) 申请公布日期 2014.08.11
申请号 KR20140012326 申请日期 2014.02.03
申请人 LAM RESEARCH CORPORATION 发明人 BUSCHE MATT;MACE ADAM;KANG MICHAEL
分类号 H01L21/3065;H01L21/205 主分类号 H01L21/3065
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