发明名称 NANOWIRE STRUCTURES HAVING WRAP-AROUND CONTACTS
摘要 Nanowire structures having wrap-around contacts are described. For example, a nanowire semiconductor device includes a nanowire disposed above a substrate. A channel region is disposed in the nanowire. The channel region has a length and a perimeter orthogonal to the length. A gate electrode stack surrounds the entire perimeter of the channel region. A pair of source and drain regions is disposed in the nanowire, on either side of the channel region. Each of the source and drain regions has a perimeter orthogonal to the length of the channel region. A first contact completely surrounds the perimeter of the source region. A second contact completely surrounds the perimeter of the drain region.
申请公布号 KR20140099306(A) 申请公布日期 2014.08.11
申请号 KR20147018009 申请日期 2011.12.23
申请人 INTEL CORP. 发明人 CEA STEPHEN M.;WEBER CORY E.;KEYS PATRICK H.;KIM, SEI YON;HAVERTY MICHAEL G.;SHANKAR SADASIVAN
分类号 H01L21/28;H01L21/336;H01L29/78 主分类号 H01L21/28
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