| 摘要 |
A pattern forming apparatus as exposure apparatus includes first and second movable stages for respectively supporting first and second boards placed thereon, and for transporting each board back and forth on a transport path. A pattern forming unit with DMD and laser forms a pattern on the board according to pattern data while the board moves into and out of a pattern forming region. A controller controls the pattern forming unit, and in a first period, moves a first board in a first direction on the transport path among plural boards, to form the pattern, and in a second period, moves a second board in the first direction on the transport path among the plural boards, to form the pattern. The pattern forming unit is disposed in a middle of the transport path, and is passed by the movable stages, for pattern forming selectively on the first and second boards. |
