PHOTOMASKS AND METHODS OF FABRICATING SEMICONDUCTOR DEVICES USING THE SAME

摘要

The present inventive concept provides a photomask including a substrate, patterns disposed on the substrate, and an anti-contamination layer disposed on the patterns. The anti-contamination layer includes at least one graphene layer. Methods of fabricating a semiconductor device including the same are also provided.

主权项

1. A photomask comprising:
a substrate; patterns disposed on the substrate; and an anti-contamination layer disposed on the patterns, the anti-contamination layer including at least one graphene layer.