| 发明名称 |
PHOTORESISTOR |
| 摘要 |
A photoresistor includes a first electrode layer, a photosensitive material layer, and a second electrode layer. The first electrode layer, photosensitive material layer and second electrode layer are stacked with each other. The first electrode layer is located on a first surface of the photosensitive material layer. The second electrode layer is located on a second surface of the photosensitive material layer. The first surface and second surface of the photosensitive material layer are opposite to each other. The first electrode layer includes a carbon nanotube film structure. |
| 申请公布号 |
US2014218161(A1) |
申请公布日期 |
2014.08.07 |
| 申请号 |
US201313858722 |
申请日期 |
2013.04.08 |
| 申请人 |
TSINGHUA UNIVERSITY ;HON HAI PRECISION INDUSTRY CO., LTD. |
发明人 |
LIU JUN-KU;LI GUAN-HONG;LI QUN-QING;FAN SHOU-SHAN |
| 分类号 |
H01L31/09;H01L31/0224 |
主分类号 |
H01L31/09 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photoresistor comprising:
a photosensitive material layer comprising a first surface and a second surface opposite to each other; a first electrode layer, located on the first surface, comprising a carbon nanotube film structure; and a second electrode layer located on the second surface. |
| 地址 |
Beijing CN |
