发明名称 DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD
摘要 <p>In order to detect, with high sensitivity and using a plurality of inspection conditions, a minute defect present on the surface of a sample, a defect inspection method: acquires a plurality of images of the same region of the sample by imaging the same region on the sample with a plurality of different image acquisition conditions; extracts defect candidates on the basis of each of the plurality of images by processing each of the plurality of acquired images of the sample; removes partial images containing an image of the defect candidate and the area surrounding the defect candidate extracted from the plurality of images of the sample acquired on the basis of the extracted location information for defect candidates; finds the feature set of the defect candidate in the plurality of partial images that were removed; correlates the defect candidates that are candidates, from the extracted defect candidates, with identical coordinates on the sample and that were detected under conditions where the image acquisition conditions were different; extracts defects from the correlated defect candidates in multidimensional feature set space; and then outputs the information for the extracted defects.</p>
申请公布号 WO2014119376(A1) 申请公布日期 2014.08.07
申请号 WO2014JP50708 申请日期 2014.01.16
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 HONDA TOSHIFUMI;URANO TAKAHIRO;NISHIYAMA HIDETOSHI
分类号 G01N21/956;H01L21/66 主分类号 G01N21/956
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