发明名称 LIGHT-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING SAME
摘要 <p>Provided is a light-sensitive resin composition. A light-sensitive resin composition according to one embodiment of the present invention can form an organic insulating film able to simultaneously satisfy properties such as resolution and adhesive strength by using an oxime-based photoinitiator, a polyfunctional monomer, a melamine crosslinking agent and a silane coupling agent.</p>
申请公布号 WO2014119849(A1) 申请公布日期 2014.08.07
申请号 WO2013KR12190 申请日期 2013.12.26
申请人 DONGJIN SEMICHEM CO., LTD. 发明人 YOUN, HYOC-MIN;PARK, JEONG MIN;KIM, JI-HYUN;LEE, JUNG-SOO
分类号 G03F7/004;G03F7/028;G03F7/26;H01L21/027 主分类号 G03F7/004
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