| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a functional film manufacturing method capable of continuously manufacturing functional films at a stable quality.SOLUTION: The method comprises: a step (a) of generating plasma in an opposite space by applying an alternating current voltage to a first film deposition roll 105 conveying a substrate 120, and a second film deposition roll 106 conveying the substrate downstream of the first film deposition roll and opposed to the first film deposition roll via an opposite space 121, and supplying film deposition gas from a gas supply part 130 opposed to the opposite space; a step (b) of forming a thin film layer on the substrate by substrate conveyance, and detecting a non-product member on the substrate upstream of the first film deposition roll; a step (c) of interrupting application of the alternating current voltage and supply of the film deposition gas when the non-product member is detected in the step (b); a step (d) of refreshing the gas supply part; a step (e) of detecting the non-product member downstream of the second film deposition roll; and a step (f) of restarting the application of the alternating current voltage and the supply of the film deposition gas when the non-product member is detected in the step (e).</p> |
