| 发明名称 |
EXPOSURE METHOD AND EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
An exposure apparatus which transfers a pattern formed on a mask onto a photosensitive substrate placed in proximity to the mask, the apparatus including an illumination optical device which illuminates the mask with an energy beam, a mask holding device which holds a periphery area of a pattern area of the mask from above, and makes a force at least within a plane parallel to a predetermined plane act on the mask and a substrate holding device which moves along the predetermined plane holding the substrate. |
| 申请公布号 |
US2014218707(A1) |
申请公布日期 |
2014.08.07 |
| 申请号 |
US201414245050 |
申请日期 |
2014.04.04 |
| 申请人 |
Nikon Corporation |
发明人 |
SHIBAZAKI Yuichi |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An exposure apparatus which transfers a pattern formed on a mask onto a photosensitive substrate placed in proximity to the mask, the apparatus comprising:
an illumination optical device which illuminates the mask with an energy beam; a mask holding device which holds a periphery area of a pattern area of the mask from above, and makes a force at least within a plane parallel to a predetermined plane act on the mask; and a substrate holding device which moves along the predetermined plane holding the substrate. |
| 地址 |
Tokyo JP |
