| 发明名称 |
RADIATION SOURCE AND LITHOGRAPHIC APPARATUS |
| 摘要 |
A radiation source comprises a nozzle configured to direct a stream of fuel droplets (400) along a trajectory towards a plasma formation location and a laser configured to direct laser radiation to the plasma formation location to convert the fuel droplets at the plasma formation location into a plasma. The laser comprises an amplifier (310, 320) and an optical element (500) configured to define a divergent beam path for radiation passing through the amplifier. |
| 申请公布号 |
US2014218706(A1) |
申请公布日期 |
2014.08.07 |
| 申请号 |
US201214241370 |
申请日期 |
2012.07.27 |
| 申请人 |
Wagner Christian;Loopstra Erik Roelof |
发明人 |
Wagner Christian;Loopstra Erik Roelof |
| 分类号 |
G03F7/20;H05G2/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A radiation source comprising:
a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; and a laser configured direct laser radiation, for instance radiation having a wavelength of between about 9 μm and about 11 μm, to the plasma formation location to convert the fuel droplets at the plasma formation location into a plasma, wherein the laser comprises an amplifier and an optical element configured to define a divergent beam path for radiation passing through the amplifier. |
| 地址 |
Duizel DE |
