发明名称 DEPOSITION PREVENTING MEMBER AND FILM DEPOSITION APPARATUS COMPRISING THE SAME AND MAINTENANCE METHOD OF DEPOSITION PREVENTING MEMBER
摘要 PROBLEM TO BE SOLVED: To provide a deposition preventing member in which a sediment formed from a deposit of particles of anti-corrosion metal for film forming may be removed easily.SOLUTION: Provided are tabular deposition preventing members 65-69 for preventing particles of anti-corrosion metal generated by sputtering, for example, in a film deposition apparatus 50 that are not used for a film deposition on a long resin film substrate F, a film deposited substrate from dispersing and depositing on other portion and cylindrical deposition preventing members 70-73 provided as necessary. Bodies of these deposition preventing members 65-73 are made of anti-corrosion material and their surfaces are covered with copper. When the maintenance is conducted, The deposit on the deposition preventing members 65-73 may be easily removed by detaching the deposition preventing members 65-73 from the film deposition apparatus 50, washing with an acid and further giving a mechanical impact by a shot-blasting and the like as necessary.
申请公布号 JP2014141709(A) 申请公布日期 2014.08.07
申请号 JP20130010674 申请日期 2013.01.23
申请人 SUMITOMO METAL MINING CO LTD 发明人 KAWAMURA YASUSHI
分类号 C23C14/00 主分类号 C23C14/00
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