发明名称 FULLY DEPLETED DIODE PASSIVATION ACTIVE PASSIVATION ARCHITECTURE
摘要 A fully depleted “diode passivation active passivation architecture” (DPAPA) produces a photodiode structure which includes a substrate, a highly-doped buffer layer of a first carrier doping type above the substrate, a low-doped or undoped semiconductor active layer of the first carrier doping type above the buffer layer, a low-doped or undoped passivation layer above the active layer, the passivation layer having a wider band gap than the active layer; and a junction layer of a carrier doping type opposite the first carrier doping type above the passivation layer such that a pn junction is formed between the junction layer and the passivation and active layers, the junction creating a depletion region which expands completely through the passivation and active layers in response to a reverse bias voltage. The fully depleted structure substantially eliminates Auger recombination, reduces dark currents and enables cryogenic level performance at high temperatures.
申请公布号 US2014217540(A1) 申请公布日期 2014.08.07
申请号 US201313758255 申请日期 2013.02.04
申请人 TELEDYNE SCIENTIFIC & IMAGING, LLC 发明人 TENNANT WILLIAM E.;LEE DONALD L.;PIQUETTE ERIC C.
分类号 H01L33/28;H01L27/15 主分类号 H01L33/28
代理机构 代理人
主权项 1. A photodiode structure, comprising: a substrate; a first passivating buffer layer of a first carrier doping type (n or p) and which is highly-doped through part or all of its thickness above said substrate; a low-doped or undoped semiconductor active layer of said first carrier doping type above said buffer layer; a low-doped or undoped second passivation layer above said active layer, said second passivation layer having a band gap energy graded over at least part of its thickness from that of the active layer to a larger energy; and a junction layer of a second carrier doping type (p or n) opposite said first carrier doping type and directly above said second passivation layer such that a pn junction is formed between said junction layer and said second passivation and active layers, said junction creating a depletion region which expands through at least said second passivation layer and said active layer in response to a reverse bias voltage; and an electrical contact with said first passivating buffer layer such that said buffer layer provides a return current path to said contact.
地址 Thousand Oaks CA US
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