发明名称 |
PLASMA-RESISTANT COMPONENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a plasma-resistant component which allows the adhesion strength or the adhesion force of a coating film covering the inner wall of a chamber to be enhanced or allows for reduction of particles.SOLUTION: The plasma-resistant component includes a substrate and a plasma-resistant layer structure including yttria polycrystal formed on the surface of the substrate. The layer structure includes: a first uneven structure; and a second uneven structure formed to overlap the first uneven structure, and having finer irregularities as those of the first uneven structure. |
申请公布号 |
JP2014141390(A) |
申请公布日期 |
2014.08.07 |
申请号 |
JP20130205278 |
申请日期 |
2013.09.30 |
申请人 |
TOTO LTD |
发明人 |
IWAZAWA JUNICHI;AOSHIMA TOSHIHIRO |
分类号 |
C04B41/87;C23C14/00;C23C16/44;H01L21/3065 |
主分类号 |
C04B41/87 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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