发明名称 Package Structure and Methods of Forming Same
摘要 A semiconductor device includes a first die having a first active surface and a first backside surface opposite the first active surface, a second die having a second active surface and a second backside surface opposite the second active surface, and an interposer, the first active surface of the first die being electrically coupled to a first side of the interposer, the second active surface of the second die being electrically coupled to a second side of the interposer. The semiconductor device also includes a first connector over the interposer, a first encapsulating material surrounding the second die, the first encapsulating material having a first surface over the interposer, and a via electrically coupling the first connector and the interposer. A first end of the via is substantially coplanar with the first surface of the first encapsulating material.
申请公布号 US2014217604(A1) 申请公布日期 2014.08.07
申请号 US201313758665 申请日期 2013.02.04
申请人 MANUFACTURING COMPANY, LTD. TAIWAN SEMICONDUCTOR 发明人 Chou Bruce C.S.;Lin Chih-Hsien;Lu Hsiang-Tai;Tu Jung-Kuo;Hsieh Tung-Hung;Lin Chen-Hua;Liu Mingo
分类号 H01L23/48;H01L23/00 主分类号 H01L23/48
代理机构 代理人
主权项 1. A semiconductor device comprising: a first die comprising a first active surface and a first backside surface opposite the first active surface; a second die comprising a second active surface and a second backside surface opposite the second active surface; an interposer, the first active surface of the first die being electrically coupled to a first side of the interposer, the second active surface of the second die being electrically coupled to a second side of the interposer; a first connector over the interposer; a first encapsulating material surrounding the second die, the first encapsulating material having a first surface over the interposer; and a via electrically coupling the first connector and the interposer, wherein a first end of the via is substantially coplanar with the first surface of the first encapsulating material.
地址 US