发明名称 HIGH PURITY DIPHENYL SULFONE, PREPARATION AND USE THEREOF FOR THE PREPARATION OF A POLY(ARYLETHERKETONE)
摘要 The presence of certain impurities in diphenyl sulfone have a deleterious effect on the properties of the poly(aryletherketone)s produced therein, including one or more of color, melt stability, molecular weight, crystallinity, etc. and here identify those impurities and provide processes for the recovery of the diphenyl sulfone.
申请公布号 US2014221595(A1) 申请公布日期 2014.08.07
申请号 US201414246901 申请日期 2014.04.07
申请人 SOLVAY ADVANCED POLYMERS, LLC 发明人 Louis Chantal;Gandy William;Ryan Edward;Underwood Geoffrey Scott;Yi Kong
分类号 C07C315/06;C08G8/02 主分类号 C07C315/06
代理机构 代理人
主权项 1. A method for the preparation of a poly(aryletherketone) by aromatic nucleophilic substitution, wherein said aromatic nucleophilic substitution comprises reacting a substantially equimolar mixture of at least one bisphenol and at least one dihalobenzoid compound or at least one halophenol compound in a solvent comprising a diphenyl sulfone wherein said diphenyl sulfone has been used in the preparation of a poly(aryletherketone) (used DPS), and wherein said used DPS meets all of the following impurity limitations:Monomethyldiphenylsulfone content (sum of all Less than 0.2 area %isomers)Monochlorodiphenylsulfone content (sum of all Less than 0.08 area %isomers)Sodium contentLess than 55 ppmPotassium contentLess than 15 ppmIron contentLess than 5 ppmResidual acidity contentLess than 2.0 μeq/gDiphenyl sulfide contentLess than 2.0 wt. %APHA of 20 wt. % solution in acetone at 25° C.Less than 50Total chlorine contentLess than 120 ppm wherein ppm and wt. % are based on the total weight of the used DPS and area % represents the ratio of the GC peak area of the impurity of concern over the total area of all GC peaks of the used DPS.
地址 Alpharetta GA US