| 发明名称 |
METHOD AND APPARATUS FOR PURGING AND PLASMA SUPPRESSION IN A PROCESS CHAMBER |
| 摘要 |
A substrate processing system includes a showerhead that comprises a head portion and a stem portion and that delivers precursor gas to a processing chamber. A baffle includes a base portion having an outer diameter that is greater than an outer diameter of the head portion of the showerhead, that comprises a dielectric material and that is arranged between the head portion of the showerhead and an upper surface of the processing chamber. |
| 申请公布号 |
US2014217193(A1) |
申请公布日期 |
2014.08.07 |
| 申请号 |
US201313760686 |
申请日期 |
2013.02.06 |
| 申请人 |
NOVELLUS SYSTEMS, INC. |
发明人 |
Breiling Patrick;Gerber Kevin;O'Loughlin Jennifer;Shankar Nagraj;Subramonium Pramod |
| 分类号 |
B05B1/00 |
主分类号 |
B05B1/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate processing system, comprising:
a showerhead that comprises a head portion and a stem portion and that delivers precursor gas to a processing chamber; and a baffle that includes a head portion having an outer diameter that is greater than an outer diameter of the base portion of the showerhead, wherein the baffle comprises a dielectric material and is arranged between the head portion of the showerhead and an upper surface of the processing chamber. |
| 地址 |
San Jose CA US |
