| 发明名称 |
Pattern Generator for a Lithography System |
| 摘要 |
A pattern generator includes a minor array plate having a mirror, at least one electrode plate disposed over the minor array plate, a lens let disposed over the minor, and at least one insulator layer sandwiched between the mirror array plate and the electrode plate. The electrode plate includes a first conducting layer and a second conducting layer. The lens let has a non-straight sidewall formed in the electrode plate. The pattern generator further includes at least one insulator sandwiched between two electrode plates. The non-straight sidewall can be a U-shaped sidewall or an L-shaped sidewall. |
| 申请公布号 |
US2014220494(A1) |
申请公布日期 |
2014.08.07 |
| 申请号 |
US201313757477 |
申请日期 |
2013.02.01 |
| 申请人 |
Yu Chen-Hua |
发明人 |
Yu Chen-Hua |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A pattern generator comprising:
a mirror array plate including a mirror; a first electrode plate disposed over the mirror array plate, wherein the first electrode plate includes at least one first conducting layer and at least one second conducting layer; a lens let disposed over the mirror, wherein the lens let includes a non-straight sidewall formed in the first electrode plate; and a first insulator layer sandwiched between the mirror array plate and the first electrode plate. |
| 地址 |
US |
