COBALT-CONTAINING COMPOUNDS, THEIR SYNTHESIS, AND USE IN COBALT-CONTAINING FILM DEPOSITION

摘要

Cobalt-containing compounds, their synthesis, and their use for the deposition of cobalt containing films are disclosed. The disclosed cobalt-containing compounds have one of the following formulae: wherein each of R1, R2, R3, R4 and R5 is independently selected from Hydrogen; halogen; linear, cyclic or branched hydrocarbons; primary amino ligands (-NHR); or secondary amino ligands (-NRR'), with R and R' independently being H or a linear, cyclic or branched hydrocarbon, provided at least one of R1, R2, or R3 in Formula I and R4 or R5 in Formula II is an amino ligand.