| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a fine structure suitable for an original plate of an anti-reflector, and a mold for nanoimprint or injection molding by a single particle film etching mask in which respective particles constituting a single particle film are close packed two-dimensionally and are arrayed with high accuracy.SOLUTION: A single particle film etching mask comprises particles close packed two-dimensionally, and displacement D(%) of particle arrays which is defined by D(%)=|B-A|×100/A is 10% or less, where "A" represents an average particle size of particles and "B" represents an average pitch between the particles in a single particle film.</p> |
