发明名称 SYSTEMS AND METHODS FOR SUB-APERTURE BASED ABERRATION MEASUREMENT AND CORRECTION IN INTERFEROMETRIC IMAGING
摘要 Systems and methods for sub-aperture correlation based wavefront measurement in a thick sample and correction as a post processing technique for interferometric imaging to achieve near diffraction limited resolution are described. Theory, simulation and experimental results are presented for the case of full field interference microscopy. The inventive technique can be applied to any coherent interferometric imaging technique and does not require knowledge of any system parameters. In one embodiment of the present invention, a fast and simple way to correct for defocus aberration is described. A variety of applications for the inventive method are presented.
申请公布号 US2014218684(A1) 申请公布日期 2014.08.07
申请号 US201414164955 申请日期 2014.01.27
申请人 Carl Zeiss Meditec, Inc. 发明人 KUMAR Abhishek;TUMLINSON Alexandre R.;LEITGEB Rainer
分类号 A61B3/10 主分类号 A61B3/10
代理机构 代理人
主权项 1. A method for characterizing a wavefront in collected interferometric data on a sample, wherein the interferometric data is generated using a broad bandwidth light source and wherein the data contains information about lateral structure within the sample, said method comprising: dividing the interferometric data into subsections at a plane where the wavefront should be characterized; generating images of the structure for at least two of the subsections by transforming each subsection of the data to an image plane in the sample containing the structure; determining a correlation between the at least two images; characterizing the wavefront using the correlation; and storing, displaying, or using as input to a subsequent process the resulting wavefront characterization.
地址 Dublin CA US