发明名称 REMOTE PLASMA TREATMENT SOURCE
摘要 The present invention relates to a remote plasma treatment source. According to an embodiment of the present invention, a remote plasma treatment source includes: a body; a nozzle to inject radicals connected to the radical outlet of the body; and an AC power source for plasma generation. According to an embodiment of the present invention, an electrode and a dielectric are installed in the plasma generation space of the body.
申请公布号 KR20140097768(A) 申请公布日期 2014.08.07
申请号 KR20130010227 申请日期 2013.01.30
申请人 KOREA BASIC SCIENCE INSTITUTE 发明人 CHOI, YONG SUP;JUNG, YONG HO;LHO, TAI HYEOP;SEOK, DONG CHAN;PARK, HYUN JAE;YOO, SEUNG RYUL
分类号 H05H1/24;H01L21/3065 主分类号 H05H1/24
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