发明名称 |
RECESSED ACCESS DEVICES AND GATE ELECTRODES |
摘要 |
Recessed access transistor devices used with semiconductor devices may include gate electrodes having materials with multiple work functions, materials that are electrically isolated from each other and supplied with two or more voltage supplies, or materials that create a diode junction within the gate electrode. |
申请公布号 |
US2014217498(A1) |
申请公布日期 |
2014.08.07 |
申请号 |
US201414247968 |
申请日期 |
2014.04.08 |
申请人 |
Micron Technology, Inc. |
发明人 |
Gibbons Jasper S.;Young Darren V.;Parekh Kunal R.;Smith Casey |
分类号 |
H01L29/423;H01L29/78 |
主分类号 |
H01L29/423 |
代理机构 |
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代理人 |
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主权项 |
1. A gate electrode, comprising:
a first gate material in a trench in a semiconductor substrate, the first gate material having a first work function associated therewith; and a second gate material at least partially within the trench, the second gate material having a second work function different from the first work function, the first gate material electrically isolated from the second gate material. |
地址 |
Boise ID US |