发明名称 |
METHODS OF DRY STRIPPING BORON-CARBON FILMS |
摘要 |
Embodiments of the invention generally relate to methods of dry stripping boron-carbon films. In one embodiment, alternating plasmas of hydrogen and oxygen are used to remove a boron-carbon film. In another embodiment, co-flowed oxygen and hydrogen plasma is used to remove a boron-carbon containing film. A nitrous oxide plasma may be used in addition to or as an alternative to either of the above oxygen plasmas. In another embodiment, a plasma generated from water vapor is used to remove a boron-carbon film. The boron-carbon removal processes may also include an optional polymer removal process prior to removal of the boron-carbon films. The polymer removal process includes exposing the boron-carbon film to NF3 to remove from the surface of the boron-carbon film any carbon-based polymers generated during a substrate etching process. |
申请公布号 |
US2014216498(A1) |
申请公布日期 |
2014.08.07 |
申请号 |
US201313760845 |
申请日期 |
2013.02.06 |
申请人 |
LEE Kwangduk Douglas;RATHI Sudha;SANKARAKRISHNAN Ramprakash;SEAMONS Martin Jay;JAMIL Irfan;KIM Bok Hoen |
发明人 |
LEE Kwangduk Douglas;RATHI Sudha;SANKARAKRISHNAN Ramprakash;SEAMONS Martin Jay;JAMIL Irfan;KIM Bok Hoen |
分类号 |
B08B7/00 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method for stripping a film from a substrate, comprising:
positioning a substrate having a film thereon in a chamber, the film comprising boron and carbon; exposing the film to a water vapor plasma at a pressure above 50 Torr to generate one or more volatile compounds from the boron and carbon; and exhausting the one or more volatile compounds from the chamber. |
地址 |
Redwood City CA US |