发明名称 METHODS OF DRY STRIPPING BORON-CARBON FILMS
摘要 Embodiments of the invention generally relate to methods of dry stripping boron-carbon films. In one embodiment, alternating plasmas of hydrogen and oxygen are used to remove a boron-carbon film. In another embodiment, co-flowed oxygen and hydrogen plasma is used to remove a boron-carbon containing film. A nitrous oxide plasma may be used in addition to or as an alternative to either of the above oxygen plasmas. In another embodiment, a plasma generated from water vapor is used to remove a boron-carbon film. The boron-carbon removal processes may also include an optional polymer removal process prior to removal of the boron-carbon films. The polymer removal process includes exposing the boron-carbon film to NF3 to remove from the surface of the boron-carbon film any carbon-based polymers generated during a substrate etching process.
申请公布号 US2014216498(A1) 申请公布日期 2014.08.07
申请号 US201313760845 申请日期 2013.02.06
申请人 LEE Kwangduk Douglas;RATHI Sudha;SANKARAKRISHNAN Ramprakash;SEAMONS Martin Jay;JAMIL Irfan;KIM Bok Hoen 发明人 LEE Kwangduk Douglas;RATHI Sudha;SANKARAKRISHNAN Ramprakash;SEAMONS Martin Jay;JAMIL Irfan;KIM Bok Hoen
分类号 B08B7/00 主分类号 B08B7/00
代理机构 代理人
主权项 1. A method for stripping a film from a substrate, comprising: positioning a substrate having a film thereon in a chamber, the film comprising boron and carbon; exposing the film to a water vapor plasma at a pressure above 50 Torr to generate one or more volatile compounds from the boron and carbon; and exhausting the one or more volatile compounds from the chamber.
地址 Redwood City CA US