COMPLEXING AGENT NON-CONTAINING CHEMICAL DECONTAMINATION AGENT FOR METAL SURFACE ADHERENCE RADIOACTIVE CONTAMINATION OXIDE FILM REMOVAL, AND CHEMICAL DECONTAMINATION METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a complexing agent non-containing low concentration chemical decontamination agent effective for removal of a metal surface adherence radioactive contamination oxide film, and chemical decontamination method using the same.SOLUTION: A chemical decontamination agent includes a reducing agent, a reducing metal ion, and an inorganic acid. A chemical decontamination method includes a process for contacting the chemical decontamination agent to metal in which a radioactive contamination oxide film is adhered on a surface. The chemical decontamination agent can effectively dissolve and remove the metal surface adherence radioactive contamination oxide film even at a low temperature. Moreover, since it can easily decompose a remaining reducing agent using an oxidizer after decontamination, an occurrence of secondary radioactive waste can be minimized, and a radioactive nuclide which remains in the decontamination solution can be removed effectively.