| 发明名称 |
UNDERLAY FILM COMPOSITION FOR IMPRINTS AND METHOD OF FORMING PATTERN AND PATTERN FORMATION METHOD USING THE SAME |
| 摘要 |
Provided is the pattern formability and line edge roughness of the resultant substrate.;An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger:;the Ohnishi parameter=(total number of atoms)/(number of carbon atoms−number of oxygen atoms) (Equation 1) |
| 申请公布号 |
US2014220353(A1) |
申请公布日期 |
2014.08.07 |
| 申请号 |
US201414245491 |
申请日期 |
2014.04.04 |
| 申请人 |
FUJIFILM CORPORATION |
发明人 |
KODAMA Kunihiko;TARUTANI Shinji;ENOMOTO Yuichiro;OOMATSU Tadashi;ITO Takayuki;KITAGAWA Hirotaka;HATTORI Akiko |
| 分类号 |
G03F7/09 |
主分类号 |
G03F7/09 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger:
the Ohnishi parameter=(total number of atoms)/(number of carbon atoms−number of oxygen atoms) (Equation 1) |
| 地址 |
Tokyo JP |
