发明名称 |
CHARGED PARTICLE BEAM DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for measuring the surface potential of a sample using a charged particle beam, by measuring the potential of a sample induced by irradiation with a charged particle beam, or detecting the compensation value of variation in the device conditions which change by charging of a sample.SOLUTION: While irradiating a sample with a charged particle beam, the charged particle beam emitted from the sample is deflected by a charged particle deflector, and the information about the sample potential is detected by using a signal obtained at that time. |
申请公布号 |
JP2014143035(A) |
申请公布日期 |
2014.08.07 |
申请号 |
JP20130009734 |
申请日期 |
2013.01.23 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
MIZUHARA YUZURU;IZAWA MIKI;YAMAZAKI MINORU;TAMURA HITOSHI;KAZUMI HIDEYUKI |
分类号 |
H01J37/20;H01J37/244;H01J37/28;H01J37/29 |
主分类号 |
H01J37/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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