发明名称 CHARGED PARTICLE BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method and a device for measuring the surface potential of a sample using a charged particle beam, by measuring the potential of a sample induced by irradiation with a charged particle beam, or detecting the compensation value of variation in the device conditions which change by charging of a sample.SOLUTION: While irradiating a sample with a charged particle beam, the charged particle beam emitted from the sample is deflected by a charged particle deflector, and the information about the sample potential is detected by using a signal obtained at that time.
申请公布号 JP2014143035(A) 申请公布日期 2014.08.07
申请号 JP20130009734 申请日期 2013.01.23
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MIZUHARA YUZURU;IZAWA MIKI;YAMAZAKI MINORU;TAMURA HITOSHI;KAZUMI HIDEYUKI
分类号 H01J37/20;H01J37/244;H01J37/28;H01J37/29 主分类号 H01J37/20
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