发明名称 Plasma generator, manufacturing method of rotating electrode for plasma generator, method for performing plasma treatment of substrate, and method for forming thin film having mixed structure by using plasma
摘要 A plasma generator according to an embodiment of the present invention is provided to generate a high density and stable plasma at near atmospheric pressure by preventing a transition of plasma to arc. The plasma generator includes a plate-shaped lower electrode for seating a substrate; and a cylindrical rotating electrode on the plate-shaped lower electrode, wherein the cylindrical rotating electrode includes an electrically conductive body that is connected to a power supply and includes a plurality of capillary units on an outer circumferential surface of the electrically conductive body; and an insulation shield layer that is made of an insulation material or a dielectric material, exposes a lower surface of the plurality of capillary units, and shields other parts.
申请公布号 US2014217881(A1) 申请公布日期 2014.08.07
申请号 US201214241223 申请日期 2012.08.10
申请人 Nam Kee-Seok;Kwon Jung-Dae;Jeong Yong Soo;Lee Gun Hwan;Yoon Jung Heum;Lee Sung Hun;Kim Dong Ho;Kang Jae Wook;Park Sung Gyu;Kim Chang Su 发明人 Nam Kee-Seok;Kwon Jung-Dae;Jeong Yong Soo;Lee Gun Hwan;Yoon Jung Heum;Lee Sung Hun;Kim Dong Ho;Kang Jae Wook;Park Sung Gyu;Kim Chang Su
分类号 H01J37/32;H01J9/02 主分类号 H01J37/32
代理机构 代理人
主权项
地址 Gyeongsangnam-do KR