Device for generating extreme UV (EUV) radiation/soft X-ray radiation, has electron beam source that is arranged in such a manner so that electron beam is stroked to discharge plasma to generate portion of EUV and/or X-ray radiation

摘要

The generating device has two opposing electrodes between a gas discharge is ignited by applying an electric voltage of a high voltage source (5) to generate a discharge plasma (6). An electron beam source is separated from the discharge plasma and arranged in such a manner so that the electron beam (10) generated by the electron beam source is stroked to the discharge plasma for generating a portion the EUV and/or X-ray radiation. An independent claim is included for a method for generating EUV radiation and/or soft X-ray radiation.