摘要 |
<p>The present invention relates to an atmospheric pressure plasma source applied to biotechnology or medical treatment. The invention is suggested to solve a problem that a processing effect is not clearly made because plasma does not directly touch a subject in an existing electrode structure. According to the present invention, an X electrode and a Y electrode are formed on a side of a board with photolithography and are coated with a dielectric, a secondary electron generating layer, and a hydration preventing layer. With the photolithography, low power and high density plasma surface discharge is enabled by increasing electrode density, plasma can directly touch the subject, and the life span of a plasma source becomes protracted through the hydration preventing layer.</p> |