发明名称 Evaporation source and Apparatus for deposition having the same
摘要 <p>Disclosed are an evaporation source and a depositing apparatus including the same. Provided is the evaporation source for forming a thin film by depositing evaporation particles on a substrate which includes: a first crucible and a second crucible which receive evaporation materials and eject the evaporation particles by evaporating the evaporation materials by heating; a first diffusion unit and a second diffusion unit which are connected to the first crucible and the second crucible, respectively; a mixing unit which is connected to the first diffusion unit and the second diffusion unit and includes a plurality of nozzles in a longitudinal direction to eject the evaporation particles to the substrate.</p>
申请公布号 KR101418713(B1) 申请公布日期 2014.08.06
申请号 KR20120153479 申请日期 2012.12.26
申请人 发明人
分类号 C23C14/24;H01L51/56 主分类号 C23C14/24
代理机构 代理人
主权项
地址