| 发明名称 |
ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN |
| 摘要 |
According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin. |
| 申请公布号 |
KR20140097204(A) |
申请公布日期 |
2014.08.06 |
| 申请号 |
KR20147013870 |
申请日期 |
2012.11.02 |
| 申请人 |
FUJIFILM CORPORATION |
发明人 |
SHIBUYA AKINORI;TOKUGAWA YOKO;MATSUDA TOMOKI;ITO JUNICHI;KATAOKA SHOHEI;FUKUHARA TOSHIAKI;TANGO NAOHIRO;IWATO KAORU;YOSHIDOME MASAHIRO;SUGIYAMA SHINICHI |
| 分类号 |
G03F7/038;G03F7/004;G03F7/039 |
主分类号 |
G03F7/038 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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