发明名称 |
PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET-SENSITIVE COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE |
摘要 |
There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer, wherein the electron beam-sensitive or extreme ultraviolet-sensitive resin composition contains (A) a resin containing (R) a repeating unit having a structural moiety capable of decomposing upon irradiation with an electron beam or an extreme ultraviolet ray to generate an acid, and (B) a solvent. |
申请公布号 |
EP2761374(A1) |
申请公布日期 |
2014.08.06 |
申请号 |
EP20120837295 |
申请日期 |
2012.09.14 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
TAKIZAWA, HIROO;IWATO, KAORU;TSUBAKI, HIDEAKI |
分类号 |
G03F7/038;G03F7/004;G03F7/039;G03F7/32;H01L21/027 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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