发明名称 SOLID-STATE ELECTRONIC DEVICE
摘要 <p>A solid-state electronic device according to the present invention includes: an oxide layer (possibly containing inevitable impurities) that is formed by heating, in an atmosphere containing oxygen, a precursor layer obtained from a precursor solution as a start material including both a precursor containing bismuth (Bi) and a precursor containing niobium (Nb) as solutes, the oxide layer consisting of the bismuth (Bi) and the niobium (Nb); wherein the oxide layer is formed by heating at a heating temperature from 520° C. to 650° C.</p>
申请公布号 KR20140097196(A) 申请公布日期 2014.08.06
申请号 KR20147013691 申请日期 2012.10.25
申请人 JAPAN SCIENCE AND TECHNOLOGY AGENCY 发明人 SHIMODA TATSUYA;TOKUMITSU EISUKE;ONOUE MASATOSHI;MIYASAKO TAKAAKI
分类号 H01L21/316;H01L21/324;H01L21/822;H01L27/04 主分类号 H01L21/316
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