发明名称 VOLTAGE ASSISTED STT-MRAM WRITING SCHEME
摘要 <p>The present invention relates to a semiconductor memory device and, more particularly, to a semiconductor memory device which includes a magnetic element. The magnetic element according to the embodiment of the present invention includes a reference layer, a free layer, a barrier layer which is located between the reference layer and the reference layer, a first electrode, an insulation layer which is located between the first electrode and the free layer, and a second electrode which is connected to the side of the free layer. According to the present invention, a small amount of currents are used and an error rate is reduced.</p>
申请公布号 KR20140096999(A) 申请公布日期 2014.08.06
申请号 KR20140003012 申请日期 2014.01.09
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 ONG ADRIAN E.;NIKITIN VLADIMIR;KROUNBI MOHAMAD TOWFIK
分类号 G11C11/15 主分类号 G11C11/15
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