| 摘要 |
A manufacturing method of an array substrate for a liquid crystal display of a molybdenum metal, aluminum metal double film or an indium oxide film is provided to residue the etch of the indium oxide film without the generation of etching sediment when etching the metal double film. A gate electrode is formed in the top of a substrate. The gate isolation layer is formed in the substrate including the gate electrode. The semiconductor layer is formed in the gate isolation layer. The source/drain electrode is formed in the above semiconductor layer. The pixel electrode connected to the drain electrode is formed. |
