发明名称 |
COMPOSITE PROTECTIVE LAYER FOR PHOTOELECTRODE STRUCTURE, PHOTOELECTRODE STRUCTURE COMPRISING THE COMPOSITE PROTECTIVE LAYER FOR PHOTOELECTRODE STRUCTURE AND PHOTOELECTOCHEMICAL CELL INCLUDING THE SAME |
摘要 |
Disclosed are a composite protective layer for a photoelectrode structure, a photoelectrode structure comprising the same and a photoelectochemical cell including the same. The composite protective layer for a photoelectrode structure includes a chemical protection layer; and a physical protection layer. The chemical protection layer has corrosion charge per unit time, 0.1 C/cm2 or less in a water decomposition potential. The physical protection layer has conductivity and moisture transmission, 0.001 g/m2/day or less. |
申请公布号 |
KR20140096916(A) |
申请公布日期 |
2014.08.06 |
申请号 |
KR20130010097 |
申请日期 |
2013.01.29 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, TAE GON;LEE, JEONG HEE;IM, SEOUNG JAE;KIM, TAE HYUNG |
分类号 |
H01M14/00 |
主分类号 |
H01M14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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