| 摘要 |
<p>The method for cleaning fluoride ion, comprises executing negative pressure in a fluoride ion cleaning (FIC)chamber, and four different cycle portions. A flow rate of hydrogen as a purge gas is 33% greater than a flow rate of hydrogen fluoride as a reactive gas in a first cycle portion. The four different cycle portions are different in total pressure, flow rate of gases and/or duration. The total pressure is = 800 mbars in the first cycle portion. The flow rate of the purge gas is reduced by 25% in a second cycle portion. The method for cleaning fluoride ion, comprises executing negative pressure in a fluoride ion cleaning (FIC) chamber, and four different cycle portions. A flow rate of hydrogen as a purge gas is 33% greater than a flow rate of hydrogen fluoride as a reactive gas in a first cycle portion. The four different cycle portions are different in total pressure, flow rate of gases and/or duration. The total pressure is = 800 mbars in the first cycle portion. The flow rate of the purge gas is reduced by 25% in a second cycle portion. The total pressure is reduced by 25% in the second phase of the cycle in the chamber. The total pressure is 600 mbars in the second and third cycle portions. The flow rate of the reactive gas is increased in a third phase of the cycle. The flow rate of the purge gas is set to zero, and the chamber is fully evacuated in a fourth cycle portion. The total pressure is reduced to 50% and is lower than 300 mbars in the chamber in the fourth cycle portion. A total cycle duration is 10% in the fourth cycle portion.</p> |
