发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE PASTE USING SAME
摘要 A photosensitive resin composition which is high in thermal decomposition property of a photocured product thereof even in a case of being subjected to heat treatment in a non-oxygen atmosphere and is less likely to generate a residue of carbon and a photosensitive paste composed of the same are provided. The composition contains (a) a photopolymerization initiator, (b) an acryl monomer, and (c) polyalkylene carbonate, in which a ratio of polyalkylene carbonate to a total amount of the acryl monomer and polyalkylene carbonate is not lower than 50 weight % and not higher than 90 weight %. Polypropylene carbonate is used as polyalkylene carbonate. The photosensitive paste is obtained by blending the photosensitive composition, a solvent, and inorganic powders. Insulating inorganic material powders or conductive metal powders are employed as the inorganic powders.
申请公布号 KR20140097304(A) 申请公布日期 2014.08.06
申请号 KR20147015200 申请日期 2012.12.03
申请人 MURATA MANUFACTURING CO., LTD. 发明人 KUBOTA MASAHIRO
分类号 G03F7/032;G03F7/004 主分类号 G03F7/032
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