发明名称 SUBSTRATE HOLDING AND ROTATING DEVICE, SUBSTRATE TREATMENT APPARATUS INCLUDING THE DEVICE, AND SUBSTRATE TREATMENT METHOD
摘要 A substrate holding and rotating device includes: a turntable rotatable; a rotative drive unit which rotates the turntable; a holding member which is provided on the turntable and horizontally holds a substrate in upwardly spaced relation to the turntable; a vertically movable protection disk disposed between the turntable and a substrate holding position; and a magnetic levitation mechanism including a first magnet attached to the protection disk, an annular second magnet which generates a repulsive force with respect to the first magnet, a support member which non-rotatably supports the second magnet, and a relative movement mechanism which moves the support member and the turntable relative to each other.
申请公布号 KR101426999(B1) 申请公布日期 2014.08.06
申请号 KR20120099918 申请日期 2012.09.10
申请人 发明人
分类号 H01L21/304;H01L21/683 主分类号 H01L21/304
代理机构 代理人
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