| 摘要 |
<p>An exposure method and apparatus for simultaneously transferring patterns with various pitches with high resolution. On the pupil surface of an illumination system, nine areas are set. The nine areas are a first area (28) including the optical axis (BX), four second areas (29A to 29D) each smaller than the first area and arranged along a first circumference (32A) surrounding the first area (28), and four third areas (30A to 30D) each smaller than the first area and arranged along a second circumference (32B) surrounding the first circumference (32A) and arranged along a second circumference. The distribution of intensity of light over the pupil surface is so set that the intensities of light over the nine areas are approximately equal to one another, and the intensity of light over the other area is smaller than those over the nine areas. This distribution of intensity of light is set using a diffraction optical element or a diaphragm.</p> |
