发明名称 |
Exposure method, substrate stage, exposure apparatus, and device manufacturing method |
摘要 |
In exposing substrate P by projecting an image of a pattern onto substrate P via projection optical system PL and liquid 1, side surface PB and underside surface PC of substrate P are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided. |
申请公布号 |
EP2738792(A3) |
申请公布日期 |
2014.08.06 |
申请号 |
EP20140150747 |
申请日期 |
2004.06.11 |
申请人 |
NIKON CORPORATION |
发明人 |
OWA, SOICHI;MAGOME, NOBUTAKA;HIRUKAWA, SHIGERU;KUDO, YOSHIHIKO;INOUE, JIRO;KOHNO, HIROTAKA;NEI, MASAHIRO;IMAI, MOTOKATSU;NAGASAKA, HIROYUKI;SHIRAISHI, KENICHI;NISHII, YASUFUMI;TAKAIWA, HIROAKI |
分类号 |
H01L21/027;G03B27/58;G03F7/20;H01L21/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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